GATE EC 2018 Set 1 — Question 30
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Question
There are two photolithography systems: one with light source of wavelength nm (System 1) and another with light source of wavelength nm (System 2). Both photolithography systems are otherwise identical. If the minimum feature sizes that can be realized using System1 and System2 are and respectively, the ratio (correct to two decimal places) is ________.
Correct answer
0.47 to 0.51
Solution
The minimum feature size () in photolithography is directly proportional to the wavelength () of the light source. This relationship is often expressed as , where is a process-dependent constant and is the numerical aperture of the lens. Since both photolithography systems are otherwise identical, and are the same for both systems.Therefore, the ratio of minimum feature sizes will be equal to the ratio of their respective wavelengths:Given:
nm
nmSubstitute the values:
Calculate the ratio:
Rounding to two decimal places, the ratio is .
nm
nmSubstitute the values:
Calculate the ratio:
Rounding to two decimal places, the ratio is .
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