GATE EC 2021 Set 1 — Question 40

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MCQ+2 / -0.67HardThreshold VoltageMOS Capacitor & MOSFETElectronic DevicesBody Effect & Channel Modulation

Electronic Devices → MOS Capacitor & MOSFET → Body Effect & Channel Modulation

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Question

For an n-channel silicon MOSFET with 10 nm gate oxide thickness, the substrate sensitivity (VT/VBS\partial V_T / \partial |V_{BS}|) is found to be 50 mV/V at a substrate voltage VBS=2|V_{BS}| = 2 V, where VTV_T is the threshold voltage of the MOSFET. Assume that, VBS2ΦB|V_{BS}| \gg 2\Phi_B, where qΦBq\Phi_B is the separation between the Fermi energy level EFE_F and the intrinsic level EiE_i in the bulk. Parameters given are
Electron charge (q) = 1.6×10191.6 \times 10^{-19} C
Vacuum permittivity (ϵ0\epsilon_0) = 8.85×10128.85 \times 10^{-12} F/m
Relative permittivity of silicon (ϵSi\epsilon_{Si}) = 12
Relative permittivity of oxide (ϵox\epsilon_{ox}) = 4
The doping concentration of the substrate is
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